- 1201 What This Chapter Covers
- 1202 What Is a Mask Work?
- 1203 Mask Work Protection Distinguished from Copyright Protection
- 1204 Protectable Mask Works
- 1205 Ineligible Mask Works
- 1207 Exclusive Rights in Mask Works
- 1208 Ownership in Mask Works
- 1209 Notice
- 1210 Registration Procedures
- 1211 Who May File Form MW?
- 1212 Completing the Application
- 1212.1 Space 1: Title of this Work
- 1212.2 Space 2: Nature of Deposit
- 1212.2(A) Space 2 Is Blank or Incomplete
- 1212.2(B) No Numeric Totals Required
- 1212.2(C) Variance in Number of Chips
- 1212.2(D) Chips Deposited for Non-Commercially Exploited Mask Work
- 1212.2(E) Variance in Number of Plots
- 1212.2(F) Space 2 Refers to a “Composite Plot” but Individual Layer Plots Deposited (or Vice Versa)
- 1212.3 Space 3: Name(s) and Address(es) of Current Owner(s)
- 1212.4 Space 4: Citizenship or Domicile of Current Owner(s)
- 1212.5 Space 5: Derivation of Ownership
- 1212.6 Space 6: Date and Nation of First Commercial Exploitation
- 1212.7 Space 7: Citizenship or Domicile of Owner at the Time of First Commercial Exploitation
- 1212.8 Space 8: Nature of Contribution
- 1212.8(A) Description Indicates That the Mask Work Is “Original” or “Entirely New”
- 1212.8(B) Mask Work Is Based on or Incorporates a Preexisting Mask Work
- 1212.8(C) Description Limits the Claim with No Indication of Preexisting Material
- 1212.8(D) Description Clearly Presents a Claim in the Functions or Uses of the Semiconductor Chip Product Embodying the Mask Work
- 1212.8(E) Description Contains Technical Terminology
- 1212.9 Space 9: Contact Person for Correspondence about the Claim
- 1212.10 Space 11: Certification
- 1212.11 Space 12: Mail Certification To
- 1213 Preparing the Deposit Material
- 1213.1 ID Material for Commercially Exploited Mask Works
- 1213.2 ID Material for Commercially Exploited Mask Works Containing Trade Secrets
- 1213.3 ID Material for Mask Works That Have Not Been Commercially Exploited: Mask Work Contains More Than Twenty Percent of Intended Final Form
- 1213.4 Mask Works Not Commercially Exploited Containing Trade Secrets
- 1213.5 Mask Works Not Commercially Exploited: Mask Work Contains Less Than Twenty Percent of Intended Final Form
- 1213.6 Special Relief from Deposit Requirements for Mask Works
- 1213.7 Deposit Retention
- 1214 Submitting the Application, Filing Fee, and Identifying Material
- 1215 Special Handling
- 1216 Correction or Amplification of a Completed Registration
- 1217 Reconsideration of Refusals to Register